The global Chemical Vapor Deposition market size is expected to reach close to USD 53.2 Billion by 2029 with an annualized growth rate of 8.3% through the projected period.
The CVD technology is used, mainly to produce high-performance solid materials mainly to manufacture thin films for the semiconductor industry. In this process, the wafer/substrate comes in contact with a volatile precursor that reacts to form different types of deposits such as pyrolytic coatings, also referred to as hard coatings.
CVD coating are generally deposited at higher temperatures and exhibit strong adhesion to glass surface. The volatile precursors for the process include halides (TiCl4, TaCl5, WF6), hydrides (SiH4, GeH4, and ammonia), metal organic compounds (metal alkyls/alkoxides/ dialylamides/diketonates/carbonyls), and others (ligands and complexes).
The current focus is on developing processes for hybrid thin in organic - organic decomposition films to lower the production cost, giving a lift to semiconductor industry. This trend has increased and tightened the titanium compounds in compliance with environmental norms.
CVD segment remained the largest through 2016 and is expected to grow in the forecast period. CVD services segment is the fastest growing chemical vapor deposition segment owing to technological advancements in technologies such as plasma enhanced process, hot-wire and combustion based.
Geographically the chemical vapor deposition equipment market is segmented into North America, Europe, Asia Pacific, the Middle East & Africa, and Latin America. Asia Pacific is the highest growing of them with a CAGR of x.x%. The region has dominated of rapid industrialization and favorable government policies for electronics and solar energy industry. North America is the second largest market and is projected to reach USD xxxx million by the end of 2025. Europe is another significant region in the global vapor deposition market, which accounted for more than 15% market share in 2017. Germany is likely to dominate the European market on account of the automotive industry. Latin America and the Middle East & Africa are estimated to grow at a moderate CAGR during the forecast period.
The global chemical vapor deposition (cvd) market is segmented into several classifications including category, application, technology, and region. Based on the category the market is categorized by CVD equipment, CVD services, and CVD materials. Furthermore, based on application the market is classified into coatings, optical coatings, protective coatings, decorative coatings, electronics, microelectronics, optoelectronics, catalysis, others. Whereas, based on the technology, the market is divided into atomic layer CVD, laser induced CVD, organometallic CVD, plasma enhanced CVD, low pressure CVD, others. Geographically, the market is widely range to North America, U.S., Canada, Europe, U.K. Italy, Spain, France, Germany, Rest of Europe, Asia Pacific, China, India, ASEAN, Rest of Asia Pacific, Japan, Latin America, Brazil Mexico, and Rest of South Africa.
Leading players of the global Chemical Vapor Deposition (CVD) market include ASM International NV, Jusung Engineering Co. Ltd., Veeco Instruments Inc., ULVAC Inc., LAM Research Corporation, Adeka Corporation, Tokyo Electron Limited, IHI Corporation, Applied Materials Inc., CVD Equipment Corporation, Richter Precision Inc., Aixtron SE, Intevac, Inc., Plasma Therm LLC, Oxford Instruments plc and Mustang Vacuum Systems.
Chemical Vapor Deposition Market Scope
| Metrics | Details |
| Base Year | 2020 |
| Historic Data | 2018-2019 |
| Forecast Period | 2021-2028 |
| Study Period | 2018-2028 |
| Forecast Unit | Value (USD) |
| Segment Covered | By Category, By Application, By Technology, Regions |
| Regions Covered | North America, Europe, Asia Pacific, South America, Middle East and South Africa |
| Key Players Profiled | ASM International NV, Jusung Engineering Co. Ltd., Veeco Instruments Inc., ULVAC Inc., LAM Research Corporation, Adeka Corporation, Tokyo Electron Limited, IHI Corporation, Applied Materials Inc., CVD Equipment Corporation, Richter Precision Inc., Aixtron SE, Intevac, Inc., Plasma Therm LLC |
Key Segmentation of the Global Chemical Vapor Deposition Market 2018-2025
By Category
- CVD Equipment
- CVD Services
- CVD Materials
By Application
- Coatings
- Optical Coatings
- Protective Coatings
- Decorative coatings
- Electronics
- Microelectronics
- Optoelectronics
- Catalysis
- Others (Nuclear, etc.)
By Technology
- Atomic Layer CVD
- Laser Induced CVD
- Organometallic CVD
- Plasma Enhanced CVD
- Plasma Assisted CVD
- Low Pressure CVD
- Others
By Region
- North America
- U.S.
- Canada
- Europe
- France
- U.K.
- Spain
- Germany
- Italy
- Rest of Europe
- Asia Pacific
- China
- Japan
- India
- ASEAN
- Rest of Asia Pacific
- Latin America
- Brazil
- Mexico
- Rest of Latin America
- Middle East & Africa (MEA)
- GCC
- South Africa
- Rest of MEA
Frequently Asked Questions (FAQ) :
The application of the chemical vapor deposition market Coatings, Electronics, Catalysis and other.
ASM International NV, Jusung Engineering Co. Ltd., Veeco Instruments Inc., ULVAC Inc., LAM Research Corporation, Adeka Corporation, Tokyo Electron Limited, IHI Corporation, Applied Materials Inc., CVD Equipment Corporation, Richter Precision Inc., Aixtron SE, Intevac, Inc., Plasma Therm LLC are a few major players in chemical vapor deposition market.
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